2018 DIENER Tetra 100 Plasma system

2018 Tetra 100_LF-PC-c

The systems can be used for reactive ion etching. This allows surfaces to be etched precisely, both chemically and physically. The height accuracy of the etching depends on the process, but can usually be controlled quite precisely down to the low two-digit to single-digit nanometer range. The system also offers the option of depositing polymerizing gases in the plasma as thin films. The height precision is of course also dependent on the process. Typical values here are also in the low two-digit nanometer range.

• Operating hours  Plasma system: 1004
• Glanded pump: 644 

The corrosive gas-resistant system has a special vacuum chamber measuring 400 mm x 625 mm x 400 mm (W x D x H). The vacuum chamber can be fully opened using an automated drawer. A holding frame for substrates is located vertically at the end of the drawer on the system side. It forms the counter electrode to the electrode in the vacuum chamber. Both electrodes are equipped with a cooling water circuit. Substrate holders with openings in the direction of the electrode can be mounted in the holding frame of the drawer. Samples that point towards the electrode through the openings in the holding frame can be treated in the plasma process. The remaining volume of the drawer is in a high vacuum during the process, but is not exposed to the plasma itself. The drawer also has flanges for inserting larger samples into the plasma chamber. Access to the drawer area is monitored by a safety system based on light barriers.

The system is fully functional. It was put into operation briefly and once for test purposes in December 2023.

- Dimensions and weights if known 

Plasma system Tetra 100_LF-PC-c

  - Dimensions (W x D x H) 600 mm x 1200 mm x 2100 mm

  - Weight: approx. 350 kg

Edwards iH1800 glanded pump

  - Dimensions: (L (to the housing of the exhaust system) x W x H (to the frequency converter))

986 (1059) mm x 470 mm x 888 (1094) mm

  - Weight: 502 kg 

Rittal SK Chiller TopTherm (SK 3334.600)

  - Dimensions: (W x D x H) 602 mm x 645 mm x 676 mm

  - Weight / operating weight: 125 kg / 155 kg

Van Der Heijden mobile refrigerator (laboratory chiller) Type: 0000-A-KH-B400-TT-12-54-62

  - Dimensions: (W x D x H) 360 mm x 470 mm x 590 mm

  - Weight: 46 kg

- Basic technical information on the plasma systems 

  - Plasma system type Tetra 100 (Diener electronic Vertriebs GmbH + Co. KG), corrosive gas version

  - Connection 400 V / 32 A

  - Full PC control with remote maintenance option via TeamViewer

  - Generator type A (80 kHz, 0 -1000 W)

  - Electrode, water-cooled, aluminium, 314 mm x 25 mm x 318 mm (W x D x H)

  - Special vacuum chamber, stainless steel, sight glasses at the rear, with drawer, automated and electrically driven, 

Dimensions W: 400 mm, D: 625 mm, H: 400 mm (volume: approx. 100 litres)

  - Water-cooled sample holder, incl. thermometer (integrated in control software) 

  - Dosing for Silan A 174 (incl. heating cartridge, dosing unit, software integration, supply to chamber via separate gas inlet)

  - Pressure reducer for oxygen, noble gases (incl. inlet and outlet pressure gauges)

  - Pressure reducer SF6, C4F8

  - 400 V Edwards iH1800 glanded pump, suction capacity 1800 m3/h

  - Rittal SK Chiller TopTherm (SK 3334.600)

  - Van Der Heijden mobile cooling unit (laboratory chiller) type: 0000-A-KH-B400-TT-12-54-62, setting range: -5°C - +25°C,

Pump capacity max. 28 l/min

  - Activated charcoal filter KF 40

  - Software language: German, English, Hungarian

  - Operating instructions in German

- Maintenance status 

Last maintenance by manufacturer 18.10.2019 (annual maintenance cycle was cancelled due to subsequent system shutdown)

- Spare parts supplied

  - 1 x electrode, water-cooled, titanium, 314 mm x 25 mm x 318 mm (W x D x H)

  - 1 x electrode, water-cooled, stainless steel, 314 mm x 25 mm x 318 mm (W x D x H), as good as new

  - 4 x holding bolt electrode

  - 1 x substrate holder

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